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飞思卡尔半导体公司的MEMS传感器技术  2009-07-20 15:36
  

MEMS是飞思卡尔为加速度计和压力传感器开发的技术。 MEMS传感器产品提供了一个能够传感、处理和(或者)控制周围环境的界面。 

飞思卡尔的基于
MEMS的传感器是一类把非常小的电子和机械部件制造在单个芯片上的器件。MEMS传感器在汽车电子、医疗设备、硬盘驱动、计算机外设、无线电子以及像手机、掌上电脑便携式聪明电子设备等等上是关键的部件。这些传感器最初用在汽车工业,特别是安全气袋系统中的撞车监测。从上个世纪90年代至今,使用MEMS技术的安全气袋传感器市场已经被证明取得了巨大成功。基于MEMS的传感器现正在蔓延到从打印机墨盒到手机的一切领域。每一个主要的市场现在已经接受了这种技术。

MEMS
的好处:
            低成本
            低能耗
            小型化
            高性能
            集成化 

飞思卡尔半导体开发基于
MEMS的传感器已经近30年了。飞思卡尔是一个大批量制造基于MEMS的传感器的制造商。用于制造传感器的加工技术大致可分为两大类:体微机械技术和表面为机械技术。下面是具体的介绍。


HARMEMS Technology

Freescale's next-generation high aspect ratio micro-electromechanical systems (HARMEMS) technology is a proven technology for airbag sensing applications. The accelerometers have an advanced transducer design that enhances sensor offset performance. HARMEMS technology provides over-damped mechanical response and exceptional signal-to-noise ratio to address customer requirements. Since the airbag main ECU system is installed in the vehicle cabin, over-damped HARMEMS technology enables a high degree of immunity to high-frequency, high-amplitude parasitic vibrations. HARMEMS technology has also been introduced in dual-axis accelerometers used in electronic stability control (ESC) to measure the lateral acceleration of the vehicle.




MEMS Surface Micromachining

In surface micromachining, the MEMS sensors are formed on top of the wafer using deposited thin film materials. These deposited materials consist of structural materials that are used in the formation of the sensors and sacrificial layers that are used to define gaps between the structural layers. Many of the surface micromachined sensors use the capacitive transduction method to convert the input mechanical signal to the equivalent electrical signal. In the capacitive transduction method, the sensor can be considered to be a mechanical capacitor in which one of the plates moves with respect to the applied physical stimulus. This changes the gap between the two electrodes with a corresponding change in the capacitance. This change in capacitance is the electrical equivalent of the input mechanical stimulus.




MEMS Bulk Micromachining

In bulk micromachining, the single crystal silicon is etched to form three-dimensional MEMS devices. This is a subtractive process in which the silicon in the wafer is specifically removed using anisotropic chemistries. Using this bulk micromachining method, sensors such as piezoresistive pressure sensors have been manufactured in high volume. In the simplest implementation, the silicon is selectively etched in certain areas to form a diaphragm. In an absolute pressure sensor, the silicon wafer is then bonded with another wafer (either of silicon or glass) to form a vacuum-sealed cavity below the diaphragm. The diaphragm then deflects in response to the applied pressure. The transduction mechanism that has been widely used is the piezoresistive effect. In piezoresistive materials, the change in the stress causes a strain and a corresponding change in the resistance. Thus, when implanted piezoresistors are formed at the maximum stress points of the diaphragm, the deflection under the applied pressure causes a change in the resistance. Typically, these piezoresistors are formed as a bridge network and the voltage applied between two terminals cause an output voltage to be measured between the other two terminals.  

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