比肩光刻机——国产首台纳米压印设备交货

Note: The English version is provided below.

摘要：

近期璞璘科技在纳米压印领域取得重要进展，8 月 1 日，其自主设计研发的首台 PL-SR 系列喷墨步进式纳米压印设备顺利通过验收并交付至国内特色工艺客户。该设备配备了自主研发的模板面型控制系统、纳米压印光刻胶喷墨算法系统、喷墨打印材料匹配及软件控制系统。通过创新材料配方与工艺调控，提高胶滴密度与铺展度，成功实现了纳米级的压印膜厚，平均残余层＜10nm，残余层变化＜2nm，压印结构深宽比> 7:1 的技术指标。目前，该设备已经初步完成储存芯片、硅基微显、硅光及先进封装等芯片研发验证。

图|PL-SR 喷墨步进式纳米压印系统

璞璘科技（杭州）有限公司成立于2017年，是一家专业从事纳米压印设备以及纳米压印材料研发、制造与销售的纳米压印高端微纳制造商。公司的纳米压印机是一种利用精密机械压印和固化技术，将纳米模板上的图案复制到基片表面的抗蚀剂层上，从而实现高分辨率、低成本纳米结构制造的专用设备。它是突破光学光刻分辨率限制、推动纳米科技发展的重要工具之一。

评论：

PL-SR是目前中国第一台采用喷墨打印步进式纳米压印机，也是至今唯一在国内已初步实现20nm以下制程的高端芯片纳米压印工艺研发的压印设备。纳米压印光刻（NIL）被视为极紫外光刻（EUV）的有力竞争者，未来，随着纳米压印光刻设备持续迭代，将可能解决国内在先进制程上面临的“卡脖子”问题。

Abstract:
Recently, PRINANO has made significant progress in the field of nanoimprint lithography. On August 1, its first independently designed and developed PL-SR series inkjet stepping nanoimprint equipment successfully passed acceptance and was delivered to a domestic customer engaged in characteristic processes. The equipment is equipped with independently developed systems, including a template surface shape control system, a nanoimprint photoresist inkjet algorithm system, as well as an inkjet printing material matching and software control system. Through innovative material formulations and process regulation, the density and spreadability of adhesive droplets have been improved, successfully achieving nanoscale imprint film thickness. It meets the technical indicators of an average residual layer of <10nm, residual layer variation of <2nm, and an aspect ratio of the imprinted structure >7:1. At present, the equipment has initially completed R&D verification for chips such as memory chips, silicon-based microdisplays, silicon photonics, and advanced packaging.

PRINANO (Hangzhou) founded in 2017, is a high-end micro-nano manufacturer specializing in the R&D, manufacturing, and sales of nanoimprint equipment and materials. The company's nanoimprinter is a specialized device that uses precision mechanical imprinting and curing technology to replicate patterns from nano-templates onto the resist layer on the substrate surface, thereby enabling high-resolution and low-cost manufacturing of nanostructures. It is one of the important tools to break through the resolution limit of optical lithography and promote the development of nanotechnology.

Comments:
The PL-SR is currently China's first inkjet printing stepping nanoimprinter and the only imprint equipment in China that has initially achieved R&D of high-end chip nanoimprint processes with a process node below 20nm. Nanoimprint lithography (NIL) is regarded as a strong competitor to extreme ultraviolet lithography (EUV). In the future, with the continuous iteration of nanoimprint lithography equipment, it may solve the "bottleneck" problem faced by China in advanced process nodes.